M109 SEM(F)

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Transcript of M109 SEM(F)

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    Table of Contents

    1. Objective .................................................................... 2

    2. Introduction ............................................................... 2

    3. Experimental Work .................................................... 3

    3.1 Equiment and Auxillaries: .................................. 3

    3.2 Experimental conditions: ................................... 3

    3.3 Set up and Experimental Procedures: ................ 34. Results ........................................................................ 4

    5. Discussion .................................................................. 9

    6. Questions ................................................................. 10

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    1. Objective

    The main purpose of this experiment is to obtain the basic knowledge of SEM

    analysis. Characterize different samples and learn the impact on resolution,

    depth of field and different type of contrast when different electronaccelerating voltages and working distances are applied.

    2. Introduction

    Since light-optical microscopy is limited by visible light (wavelength 400nm

    700nm), the maximum resolution is about 200nm, the electron microscopy

    took its advantages in both high magnification and depth of focus. Scanning

    electron microscopy (SEM) is well performance on the material surface

    analysis.

    SEM device is briefly shown in the figure 1. It mainly consists of an electron

    emitting system, lens system, specimen chamber, and operating screen. The

    certain vacuum is needed in the whole device. An additional sample changing

    chamber is separated from the main chamber, providing a saving of time

    during changing samples.

    Figure 1 construction of SEM

    In SEM, electrons are accelerated towards the surface of specimen. The

    interaction takes place between electrons and specimen, secondary electrons

    (SE) and back scattered electrons (BSE) are two important signal escaped

    from the surface, containing an energy ESE 50eV and EBSE 50eV. They are

    caught by detectors and then converted to image.

    In an electron gun, electrons are produced by thermal emission. The filament

    is heated up to operate the emission of free electrons. The accelerating

    voltage accelerates the electrons towards the anode. The impact ofaccelerating voltage is respectively important to the resolution of surface

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    image, surface structure, edge effects and sample charge up.

    Working distance is the distance between sample and the final lens. It

    impacts the resolution of image and depth of field.

    3. Experimental Work

    3.1 Equiment and Auxillaries:

    Smart SEM (Scanning Electron Microscope) (Brand: ZEISS Ultra Series

    Detection Plurality with Gemini Column.)

    Three samples for characterizing the structure and learning the

    influence\effect of variables like accelerating voltage, magnification and

    working distance etc. on the result and qualities of the micrograph.

    Sample 1: Gold coating on Si substrate

    Sample 2: ZnO (Zinc-oxide) coating on Si Substrate

    Sample 3: Sn (Tin) on carbon coated, coated with gold to increase

    conductivity and reduce the charge effect.

    3.2 Experimental conditions:

    Vacuum in the SEM column: 4.8x10-7

    bar

    Vacuum in the filament\electron gun: 5.8x10-10

    bar

    Others variables like magnification, working distance and acceleration voltage

    is mention below the micrographs.

    3.3 Set up and Experimental Procedures:

    3.3.1 Set up

    The SEM consists of a filament chamber where the electron source is

    produced. At least two pumps are needed in order to create a required vacuum

    inside it.

    The sample is placed into the specimen chamber through an exchangechamber without venting the whole system, as getting the vacuum is a long

    time procedure.

    In the control panel of the SEM the focus, magnification, contrast, brightness

    and stigmator correction buttons are found.

    The access to the digital imaging scanning system and the digital imaging

    processing system is made through the monitor of the computer placed aside

    the control panel. These programs are used to manipulate the image that one

    wants to get from the SEM.

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    3.3.2 Experimental procedure

    The first thing to do is to install the sample in the chamber of the SEM; gloves

    must be worn so there is no contamination in the vacuum. For sample to be

    firm at their position, the sample must be screwed in a sample holder.

    Once the sample is ready, it is introduced in the exchange chamber, prior vent

    of it. After that, vacuum is applied in the exchange chamber so that the valve

    between the exchange and specimen chambers can be opened and the sample

    is transferred to the latter.

    After completing this procedure, the monitors are turned on. The high voltage

    is turned on, so it goes up until 12 kV. When the set-up of the SEM is done,

    Live SE is turned on in the Digital Imaging Scanning System to find the

    sample and focus it. Once the sample is found and focused, the magnification

    is increased in order to see the surface of the sample much clearer. With theDigital Imaging Processing System the photographs of the samples surface

    are saved and measures are taken, if necessary. The whole procedure is

    repeated for the remaining 2 samples.

    After the analysis of the samples, accelerating voltage put off. Finally, the

    sample is taken out and the exchange chamber has to be vented.

    4. Results

    Figure 1: Shows the surface micrograph of sample 1 at 917X Mag, 12KV Acc.

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    volts and 2.6 WD.

    Figure 2: Shows the micrograph of sample 1 (gold on Si substrate) at 2002X

    Mag, at same Acc. volts and WD as that of figure 1.

    Figure 3: Shows the micrograph of sample 1 (gold on Si substrate) at much

    higher Mag 33470X.

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    Figure 4: Shows the micrograph of sample 1 with astigmatism at 9320X.

    Figure 5: Shows the micrograph of sample 1 without stigmatism at 9320X.

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    Figure 6: Shows the micrograph of sample-substrate-sample holder interface

    of sample 2 at 309X Mag for studying the density contrast effect in SEM

    micrographs.

    Figure 7: Shows the microstructure of zinc oxide film (sample 2) at 3170X

    Mag and 12 KV Acc. Volts.

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    Figure 8: Shows the microstructure of zinc oxide film on Si substrate (sample

    2) at 3170X Mag and 1 KV Acc. Volts.

    Figure 9: Shows the microstructure of sample 3 (tin on carbon) at 11130X

    Mag, 12 KV Acc. Volts and 2mm WD.

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    Figure 10: Shows the microstructure of sample 3 at 11150X Mag, 12 KV Acc.

    Volts and 9.2mm WD.

    5. Discussion

    Figure 1 to 5 correspond to the structure of thin film of gold (sample 1) at

    different magnification, the purpose behind that was to characterize the thin

    film of gold. Figure 1 reveals the network of gold (thin film) deposited on the

    silicon substrate, gold thin film has better contrast than silicon substrate which

    was looking as black in the background. At higher magnification Figure 2

    shows that gold thin film (sample 1) composed of spherical, trigonal and

    hexagonal particles. At more higher magnification then 2000X it can be seen

    from figure 3 that the small spherical particles joined with the trigonal and

    hexagonal particles, aslo from figure 3 one can find the size of spherical

    particles which was approximately about 600 nm to 800 nm.

    Figure 4 show the presence of astigmatism which is basically the type of

    aberration in the objective lens, caused image stretching in one direction. It is

    very difficult to get information from such images because image was too blur,

    distorted and give false information as was stretched in one direction. Figure 5

    has the same magnification as that of figure 4 but it without astigmatism. It

    is observed that the effect of astigmatism was more prominent at higher

    magnification.

    An image is said astigmatism free if it has no unidirectional defocussing when

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    the objective lens was changed to under or over focus at a little high

    magnification.

    Figure 6 is the sample- substrate-sample holder interface, one can see the

    better contrast of ZnO than Si substrate and Aluminium sample holder,furthermore it was noted that Si substrate has better contrast the Al sample

    holder which was looking dark in the image. This effect is called Z contrast in

    SEM in which High Z (atomic number) material show better contrast than

    lower Z materials.

    The effect of accelerating potential can be observed by comparing figure 7

    and 8 while keeping the magnification and working kept constant. Figure 7

    contain high resolution, more edge effect and unclear surface structure where

    figure 8 contain less edge effects, low resolution but it contain clear surface

    structures. Moreover, it was concluded from both the micrograph that thinfilm of zinc oxide (sample 2) has a star like structure.

    The effect of working distance on the image can be seen clearly by comparing

    figure 9 and 10 while keeping magnification and acceleration potential keep

    constant. Higher working distance increased the resolution while the depth

    of field decreases, this can be seen by viewing figure 10 that contain high

    resolution while high depth of field obtain in figure 9. Moreover, figure 9 and

    10 correspond to the sample which tin (Sn) coated on carbon, it was clear

    from the figure that the round particles were tin which were spread along the

    carbon matrix. Also high contrast of tin spherical particle then carbon matrix

    is because of Z contrast.

    6. Questions

    1. How can the range of usage of a light-optical microscope be extended?

    Resolution can be defined as the smallest distinct difference between two

    distinct points. Any resolution more this would be proved fruitless.

    The dependence of resolution can be found by Rayleigh rule;

    r = (0,61) / (sin)Higher resolution can be achieved by lowering the wavelength and decreasing

    the distance between the sample and the lens, as well as higher index of

    refraction.

    Changing of wavelength is near impossible in light microscope whereas

    increasing the lens magnification is also quite difficult. Hence only the

    distance between the objective lens and the sample can be decreased.

    2. Which are the advantages/disadvantages of transmission electron

    microscopy (TEM) in comparison to scanning electron microscopy (SEM)?

    The advantages of TEM in comparison with SEM are; it has a higher

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    resolution (as small as 0.2 nm) and that it shows a direct imaging of

    crystalline lattice and delineates defects (like dislocation, twin boundaries and

    tilt boundaries) inside the sample, while SEM shows only the surface of the

    sample.

    The disadvantage of TEM in comparison with SEM is that anelectron-transparent sample is required and its preparation is difficult.

    3. Which are the scattering types that can occur at atoms in case of accelerated

    electrons? Give some examples.

    Elastic or inelastic scattering can occur.

    In the case of the elastic scattering there is no significant energy loss,

    therefore the electron can leave the solid. One example would be the

    backscattered electrons, which are created by the interactions between

    electrons from the probe and atoms or between electrons from the probe and

    the crystal lattice.The inelastic scattering occurs when there are energy losses and the electron

    remains in the solid. Some examples are: Secondary electrons, X-rays, Auger

    electrons, formation of electron-hole pairs resulting in cathode-luminescence.

    These are created due to the transfer of energy from the primary electrons to

    the solid.

    4. Field emission SEM: Describe the principle. Which are the advantages of

    this method?

    The principle of a Field Emission SEM (FESEM) is as follows. Electrons

    generated by a Field Emission Source (cold cathode field emitter) are

    accelerated in a field gradient under vacuum. The beam passes through

    electromagnetic lenses, focusing onto the specimen, so that different types of

    electrons are emitted from the sample. A detector gets the secondary electrons

    and an image of the sample surface is constructed by a comparison of the

    intensity of the secondary electrons to the scanning primary electron beam.

    The image is displayed in a monitor.

    The advantages of FESEM are:

    - It produces a clearer and less electrostatically distorted image with a spatial

    resolution lower than 1.5 nm (3-6 times better than regular SEM).- High quality, low voltage images are obtained with negligible electrical

    charging of samples.